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Method of fabricating submicron suspended objects and application to the mechanical characterization of said objects
Method of fabricating submicron suspended objects and application to the mechanical characterization of said objects
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机译:制备亚微米级悬浮物的方法及其在机械表征中的应用
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摘要
A method of fabricating submicron objects that includes the following steps: depositing a void layer on a support, depositing a transfer layer on the void layer, producing the objects in the transfer layer, producing a hard mask on a portion of the transfer layer to delimit a region comprising a portion of the objects, and etching the combination formed by the hard mask, the transfer layer and the void layer to eliminate the hard mask and the portion of the transfer layer in the region and to open up the portion of the void layer under the region so that the objects are suspended, the rate of etching the void layer being greater than the rate of etching the transfer layer and the hard mask.
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