METHODS FOR FABRICATING ISOLATED MICRO-AND NANO-STRUCTURES USING SOFT OR IMPRINT LITHOGRAPHY

摘要

The presently disclosed subject matter describes the use of fluorinated elastomer-based materials, in particular per-opolyether (PFPE)-based materials, in high-resolution soft or imprint lithographic applications, such as micro- and nanoscale replica molding, and the first nano-contact molding of organic materials to generate high fidelity features using an elastomeric mold. Accordingly, the presently disclosed subject matter describes a method for producing free-standing, isolated nanostructures of any shape using soft or imprint lithography techniques.