This study presents a stable and flexible method for fabricating a free-standing polymer membrane with perforated micro- and nanopores using an imprint lithography combined with a pressed self-perfection method and a sacrificial layer technique. For the fabrication, micropores were initially patterned on a double resist layer: the upper SU-8 resist layer as an active membrane layer and the lower life-off resist used as a sacrificial layer. The membrane with micropores was then pressed with a flat quartz wafer to reduce pore size down to sub-micrometer. Finally, a free-standing SU-8 membrane with perforated micro- and nanopores was successfully lifted-off from the substrate by dissolving the sacrificial layer.
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