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PROCESS FOR ALLOYING SEMICONDUCTORS BY USE OF RECOIL ATOMS FROM METAL FILMS IN EXTERNAL ELECTRIC FIELD

机译:在外部电场中使用金属膜中的回弹原子来合金化半导体的方法

摘要

A process for alloying semiconductors by use of recoil atoms from metal films in external electric field in the process of radiation of system metal-semiconductor by beam of accelerated ions with influence of voltage pulse on the system. Value and direction of external electric field in the process of alloying are modified, at that profile of recoil atoms concentration in semiconductor is purposely modified.
机译:通过在电压脉冲对系统的影响下,通过加速离子束对系统金属半导体进行辐射的过程中,利用外部电场中金属膜中的反冲原子使半导体合金化的方法。修改合金化过程中外部电场的值和方向,从而有目的地修改半导体中反冲原子浓度的分布。

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