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METHOD AND SYSTEM FOR A MASKLESS LITHOGRAPHY RASTERIZATION TECHNIQUE BASED ON GLOBAL OPTIMIZATION
METHOD AND SYSTEM FOR A MASKLESS LITHOGRAPHY RASTERIZATION TECHNIQUE BASED ON GLOBAL OPTIMIZATION
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机译:基于全局优化的无光刻光刻技术的方法和系统
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摘要
Provided are a method and system for determining states of spatial light modulator (SLM) pixels in a lithography system configured to print a desired pattern. The method includes determining diffraction orders associated with an ideal mask of a pattern to be printed by the lithography system, and then configuring the states of the SLM pixels to match all the diffraction orders that are relevant in the image formation.
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