system for measuring the electron density and plasma process, the changes in the resonance frequency of a plasma containing open in use

• 1. 利用包含等离子体的开式谐振腔谐振频率的变化来测量电子密度并控制等离子体处理的系统 [P] . 中国专利： CN1361863A . 2002-07-31
• 2. 使用等离子体诱导微波振荡器频率变化的电子密度测量和控制系统 [P] . 中国专利： CN1162712C . 2004.08.18
• 3. A system for measuring the electron density and the plasma process control, the changes in the resonance frequency of a plasma open resonator is used containing [P] . 德国专利： DE60035513T2 . 2008-03-20

  机译： 用于测量电子密度和等离子过程控制的系统，使用等离子开放式谐振器的谐振频率变化

• 4. system for measuring the electron density and plasma process, the changes in the resonance frequency of a plasma containing open in use [P] . 德国专利： DE60035513D1 . 2007-08-23

  机译： 测量电子密度和等离子体过程的系统，使用中的等离子体的共振频率的变化

• 5. Electron density measurement and the plasma processing control system which utilize the change of resonance frequency of the release type resonator which accommodates the plasma [P] . 日本专利： JP2003523045A . 2003-07-29

  机译： 利用容纳等离子体的释放型共振器的共振频率的变化的电子密度测量和等离子体处理控制系统

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• 2. Correlation of Ⅲ/Ⅴ semiconductor etch results with physical parameters of high-density reactive plasmas excited by electron cyclotron resonance [J] . Gerhard FRANZ, Ralf MEYER, Markus-Christian AMANN 等离子体科学和技术（英文版） . 2017,第012期
• 3. Diagnosis of Unmagnetized Plasma Electron Number Density and Electron-neutral Collision Frequency by Using Microwave [J] . Yuan Zhongcai, Shi Jiaming, Xu Bo 等离子体科学和技术（英文版） . 2005,第006期
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• 5. Measurements of metastable atom density using energies and densities of energetic “fast” electrons detected in the electron energy distribution function associated with the afterglow plasma produced by a radio frequency inductively coupled plasma helium discharge [D] . Blessington, Jon C. 2007
• 6. Dense GeV electron–positron pairs generated by lasers in near-critical-density plasmas [O] . Xing-Long Zhu, Tong-Pu Yu, Zheng-Ming Sheng, -1
• 7. Respone to "Comment on 'Instability of the Shukla mode in a dusty plasma containing equilibrium density and magnetic field inhomogeneities' and 'New resonance and cutoff for low-frequency electromagnetic waves in dusty magnetoplasmas'" [Phys. Plasmas 11, 4154 (2004)] [O] . Shukla, P., Bharuthram, R., Mamun, A., 2004
• 8. On the Impedance Method for Measuring High Electron Density and Electron Collision Frequency in a Gaseous Plasma Column [R] . Coffey, D. M. 1965

• 1. Electron Density and Optical Emission Measurements of SF_6/O_2 Plasmas for Silicon Etch Processes [J] . M.M.MORSHED ,S.M.DANIELS . 等离子体科学与技术：英文版 . 2012,第4期
• 2. Effect of Low-frequency Power on F, CF_2 Relative Density and F/CF_2 Ratio in Fluorocarbon Dual-Frequency Plasmas [J] . 黄宏伟 ,叶超 ,徐轶君 . 等离子体科学与技术：英文版 . 2010,第5期
• 3. 研究等离子体密度变化的毫米波测量系统 [C] . 曹金祥 . 1993年全国微波会议 . 1993
• 4. 等离子体内部电磁场测量系统中探针放置导致的测量误差 [A] . 韩明智 . 2020