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Lead germanate ferroelectric structure with multi-layered electrode

机译:带有多层电极的锗酸铁铁电结构

摘要

The ferroelectric structure including a Pt/Ir layered electrode used in conjunction with a lead germanate (Pb5Ge3O11) thin film is provided. The electrode exhibits good adhesion to the substrate, and barrier properties resistant to oxygen and lead. Ferroelectric properties are improved, without detriment to the leakage current, by using a thin IrO2 layer formed in situ, during the MOCVD lead germanate (Pb5Ge3O11) thin film process. By using a Pt/Ir electrode, a relatively low MOCVD processing temperature is required to achieve c-axis oriented lead germanate (Pb5Ge3O11) thin film. The temperature range of MOCVD c-axis oriented lead germanate (Pb5Ge3O11) thin film on top of Pt/Ir is 400-500° C. Further, a relatively large nucleation density is obtained, as compared to using single-layer iridium electrode. Therefore, the lead germanate (Pb5Ge3O11) thin film has a smooth surface, a homogeneous microstructure, and homogeneous ferroelectric properties. A method of forming the above-mentioned multi-layered electrode ferroelectric structure is also provided.
机译:提供一种铁电结构,该铁电结构包括与锗酸铅(Pb5Ge3O11)薄膜结合使用的Pt / Ir层状电极。电极对基材表现出良好的附着力,并具有抗氧和铅的阻隔性能。通过在MOCVD锗酸铅(Pb5Ge3O11)薄膜工艺中使用原位形成的IrO2薄层,可以改善铁电性能,而不会损害漏电流。通过使用Pt / Ir电极,需要相对较低的MOCVD处理温度才能获得c轴取向的锗酸铅(Pb5Ge3O11)薄膜。 Pt / Ir顶部的MOCVD c轴取向锗酸铅(Pb5Ge3O11)薄膜的温度范围为400-500°C。此外,与使用单层铱电极相比,可以获得相对较大的成核密度。因此,锗酸铅(Pb5Ge3O11)薄膜具有光滑的表面,均匀的微观结构和均匀的铁电特性。还提供了一种形成上述多层电极铁电结构的方法。

著录项

  • 公开/公告号EP1056125B1

    专利类型

  • 公开/公告日2007-06-27

    原文格式PDF

  • 申请/专利权人 SHARP KK;

    申请/专利号EP20000304385

  • 发明设计人 HSU SHENG TENG;ZHANG FENGYAN;LI TINGKAI;

    申请日2000-05-24

  • 分类号H01L21/316;H01L21/02;

  • 国家 EP

  • 入库时间 2022-08-21 20:50:12

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