首页> 外国专利> LIGHT BEAM INTENSITY NON-UNIFORMITY CORRECTION DEVICE AND METHOD FOR AMENDING INTENSITY DISTRIBUTION OF A LIGHT BEAM

LIGHT BEAM INTENSITY NON-UNIFORMITY CORRECTION DEVICE AND METHOD FOR AMENDING INTENSITY DISTRIBUTION OF A LIGHT BEAM

机译:光束强度非均匀性校正装置和修正光束强度分布的方法

摘要

The invention relates to a light beam intensity non-uniformity correction device (34) comprising an optical element (34) having a light entrance face (36) with an antireflective property. According to the invention said antireflective property is locally amended in order to enhance light beam intensity uniformity. The invention further relates to a method for amending intensity distribution of a light beam (12) in an optical system (2) having one optical element or a plurality of optical elements (16, 24, 26, 34), comprising the steps of: a) assembling said optical system (2) with said optical elements (16, 24, 26, 34) being arranged in predetermined positions, b) measuring intensity distribution, c) calculating locally required increase or decrease in absorption and/or reflection of one of said optical elements (34) in order to amend measured intensity distribution into a predetermined intensity distribution, d) removing said one of said optical elements (34) from said optical system (2), e) locally amending absorption and/or reflection of said one of said optical elements according to the calculation, f) installing said one of said optical elements (34) in said predetermined position in said optical system (2).
机译:本发明涉及一种光束强度不均匀校正装置(34),其包括具有具有抗反射特性的光入射面(36)的光学元件(34)。根据本发明,所述抗反射特性被局部地修改以便增强光束强度的均匀性。本发明还涉及一种用于在具有一个或多个光学元件(16、24、26、34)的光学系统(2)中修正光束(12)的强度分布的方法,该方法包括以下步骤: a)将光学元件(16、24、26、34)布置在预定位置上组装光学系统(2),b)测量强度分布,c)计算局部所需的吸收和/或反射的增加或减少为了将测得的强度分布修改为预定的强度分布,d)从所述光学系统(2)中移除所述光学元件(34)之一,e)局部修改光学元件(34)的吸收和/或反射。根据计算,所述光学元件之一; f)将所述光学元件之一(34)安装在所述光学系统(2)中的预定位置。

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