首页> 外国专利> METHODS OF TREATING DEPOSITION PROCESS COMPONENTS TO FORM PARTICLE TRAPS, AND DEPOSITION PROCESS COMPONENTS HAVING PARTICLE TRAPS THEREON

METHODS OF TREATING DEPOSITION PROCESS COMPONENTS TO FORM PARTICLE TRAPS, AND DEPOSITION PROCESS COMPONENTS HAVING PARTICLE TRAPS THEREON

机译:处理沉积过程成分以形成颗粒陷阱的方法,以及具有颗粒陷阱的沉积过程成分

摘要

The invention includes methods for forming particle traps along surfaces of PVD components, and comprises PVD components having particle traps thereon. The invention can include utilization of highly soluble media for bead-blasting and/or can include utilization of metallic materials as bead-blasting media. The invention can also include formation of an insert along regions of a backing plate where particle traps are desired, with the insert being of a composition which has better particle-trapping properties than the backing plate.
机译:本发明包括用于沿着PVD部件的表面形成粒子阱的方法,并且包括其上具有粒子阱的PVD部件。本发明可以包括利用高可溶性介质进行喷丸处理和/或可以包括利用金属材料作为喷丸处理介质。本发明还可包括沿着需要颗粒捕集器的背板区域形成插入物,该插入物具有比背板具有更好的颗粒捕获特性的组成。

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