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PHOTOACTIVE FILM, ITS PREPARATION AND USE, AND PREPARATION OF SURFACE RELIEF AND OPTICALLY ANISOTROPIC STRUCTURES BY IRRADIATING SAID FILM

机译:光辐照膜,其制备和使用以及通过辐照所述膜制备表面浮雕和光学各向异性结构

摘要

The present invention relates to a homogeneous, photoactive film consisting of or comprising a polyelectrolyte carrying residues which may undergo a photoreaction, the polyelectrolyte mainly comprising at least one structure according to any of formulae (I) to (IV), namely [Pol(R*-P-R')]o on+ n/x Ax- (I), n/x Ax+ [Pol(R*-P-R') ]oon- (II), [Pol(R1*-Q-R1')]oon+ n/x Ax- (III), n/x Ax+ [Pol(R1*-Q-R1')]oon- (IV) , wherein Pol means a repeating unit of a linear or branched polymer chain, o indicates the number of the repeating unit of the polymer chain, and (R*-P-R') and (R1*-Q-R1') are n-fold positively or negatively charged side chains of the repeating unit Pol, wherein P is a group which is capable of photo-induced E/Z isomerization, Q is a group capable of participating in a photocycloaddition, or capable of participating in a photoinduced rearrangement, or the so called Photo-Fries reaction, A is a cation or anion which is oppositely charged, n is preferably 1 or 2, x is 1 or 2, and o is at least 2, with the proviso that in one polyelectrolyte, groups [R-P-R'] and/or [R1-Q- R1'] all have the same sign. The invention is further directed to the preparation of the film, its use and a method for the preparation of a replica of a film of the invention having a surface relief structure.
机译:本发明涉及一种均质的光敏膜,该膜由以下组成或包含带有可经历光反应的残基的聚电解质,该聚电解质主要包含至少一种根据式(I)至(IV)的结构,即[Pol(R) * -P-R')] oon + n / x Ax-(I),n / x Ax + [Pol(R * -P-R')] oon-(II),[Pol(R1 * -Q-R1 ')] oon + n / x Ax-(III),n / x Ax + [Pol(R1 * -Q-R1')] oon-(IV),其中Pol表示线性或支链聚合物链的重复单元,表示聚合物链的重复单元的数目,并且(R * -P-R')和(R1 * -Q-R1')是重复单元Pol的n倍带正电荷或负电荷的侧链,其中P是能够光诱导的E / Z异构化的基团,Q是能够参与光环加成或能够参与光致重排的基团,或所谓的Photo-Fries反应,A是阳离子或阴离子带相反电荷的n优选为1或2,x为1或2,oi至少为2,条件是在一种聚电解质中,基团[R-P-R']和/或[R1-Q-R1']都具有相同的符号。本发明进一步涉及膜的制备,其用途以及制备具有表面浮雕结构的本发明膜的复制品的方法。

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