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Photoactive Film, Its Preparation And Use, And Preparation Of Surface Relief And Optically Anisotropic Structures By Irradiating Said Film

机译:光敏膜及其制备和用途,以及通过辐照所述膜制备表面起伏和光学各向异性结构

摘要

The present invention relates to a homogeneous, photoactive film consisting of or comprising a polyelectrolyte carrying residues which may undergo a photoreaction, the polyelectrolyte mainly comprising at least one structure according to any of formulae (I) to (IV), namely [Pol(R*—P—R′)]oon+n/xAx− (I), n/xAx+[Pol(R*—P—R′)]oon− (II), [Pol(R1*-Q-R1′)]oon+n/xΛx− (III), n/xΛx+[Pol(R1*-Q-R1′)]oon− (IV), wherein Pol means a repeating unit of a linear or branched polymer chain, o indicates the number of the repeating unit of the polymer chain, and (R*—P—R′) and (R1*-Q-R1′) are n-fold positively or negatively charged side chains of the repeating unit Pol, wherein P is a group which is capable of photo-induced E/Z isomerization, Q is a group capable of participating in a photocycloaddition, or capable of participating in a photoinduced rearrangement, or the so called Photo-Fries reaction, A is a cation or anion which is oppositely charged, n is preferably 1 or 2, x is 1 or 2, and o is at least 2, with the proviso that in one polyelectrolyte, groups [R—P—R′] and/or [R1-Q-R1′] all have the same sign. The invention is further directed to the preparation of the film, its use and a method for the preparation of a replica of a film of the invention having a surface relief structure.
机译:本发明涉及一种均质的光敏膜,该膜由以下组成或包含带有可经历光反应的残基的聚电解质,该聚电解质主要包含至少一种根据式(I)至(IV)的结构,即[Pol(R) * —PR')] o on + n / xA x − (I),n / xA x + [Pol(R * -P-R')] o on-(II),[Pol(R 1 *-QR 1')] o on + n /xΛ x-(III),n /xΛ x + [Pol(R 1 *-QR 1')] o on-上的(IV ),其中Pol表示直链或支链聚合物链的重复单元,o表示聚合物链的重复单元的数目,和(R * -P-R')和(R 1 * -QR 1')是重复单元Pol的n倍带正电荷或负电荷的侧链,其中P是能够进行光诱导的E / Z异构化的基团,Q是一个基团能够参与光环加成或能力e参与光致重排或所谓的Photo-Fries反应,A为带相反电荷的阳离子或阴离子,n优选为1或2,x为1或2,并且o至少为2,前提是在一种聚电解质中,[R-P-R']和/或[R 1 -QR 1']基团均具有相同的符号。本发明进一步涉及膜的制备,其用途以及制备具有表面浮雕结构的本发明膜的复制品的方法。

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