Noninvasive system of measuring ion energy distribution for plasma apparatus and method of measuring ion energy distribution using the same

摘要

The present invention is a plasma generating means for generating a plasma within the chamber portion, and part of the chamber comprising an electrode which relates to ion energy distribution measurement method using noninvasive ion energy distribution measurement system for a plasma device, and this, the substrate is mounted and , and bias application means for applying a bias potential to the electrode, is connected to a bias potential measurement means, means said chamber portion and said plasma generation for measuring the bias potential applied to the electrode process for measuring a process variable measuring a variable measuring means and the ion energy distribution with a bias potential and the parameters, and provides a noninvasive measure ion energy distribution system for a plasma device comprising a control and analysis to control the operation of the measuring means. It without direct contact with the plasma through a process variable measured in the external chamber, and measuring the plasma potential by a bias electrode potential, it is possible to measure the plasma ion energy distribution in real time. ; Plasma, ion energy, non-contact, and a bias, etching, plasma potential