AMONIA SUPPLY DEVICE EQUIPPED FLOW METER AND AMONIA FLOW DETECTING METHOD

摘要

The present invention is whether the ammonia used for the cleaning of the semiconductor wafer manufacturing process, the injection nozzle which relates to the flow of ammonia to be supplied and the ammonia flow sensing device is provided sensing method meth. ; The chemical mechanical polishing of semiconductor manufacturing process as one method that is applied to the process of planarization of the wafer process (Chemical mechanical polishing : hereinafter "CMP" referred to) has a ; The use of ammonia to remove impurities of the rough surface of the wafer CMP process ; However, a problem with the flow of ammonia the problem of future devices that can not detect the presence of a large amount of the wafer is a defect in the wafer pass generation was not performed if the result is normal washing. ; This invention is in the ammonia supply flow line meta, meta install the flow control unit, the display device is effective to detect whether or not there is a problem with the flow of ammonia.