首页> 外国专利> METHOD FOR PRODUCING NOZZLE SUBSTRATE, METHOD FOR PRODUCING DROPLET-DISCHARGING HEAD, HEAD FOR DISCHARGING DROPLETS, AND APPARATUS FOR DISCHARGING DROPLETS

METHOD FOR PRODUCING NOZZLE SUBSTRATE, METHOD FOR PRODUCING DROPLET-DISCHARGING HEAD, HEAD FOR DISCHARGING DROPLETS, AND APPARATUS FOR DISCHARGING DROPLETS

机译:喷嘴基体的制造方法,液滴喷头的制造方法,液滴的喷出头,以及液滴的喷出装置

摘要

A method for producing a nozzle substrate, a method for producing a droplet-discharging head, a head for discharging droplets, and an apparatus for discharging droplets are provided to improve the productivity and the rate of products according to the materials by the easy handling. A method for producing nozzle substrate includes the steps of forming by the etching process concave units which are a plurality of nozzle holes to discharge a droplet on the processed substrate, coupling a first sustaining substrate(61) on the surface of the processing side of the processed substrate which has the concave units, opening the edge of the concave units by thinning processing the processed substrate according to the wanted thickness from the opposite side of the coupled surface of the first sustaining substrate, coupling a second sustaining substrate on the surface of the opened side of the concave units, peeling the first sustaining substrate from the processed substrate, and coupling a third substrate on the peeled surface, and peeling the second sustaining substrate from the processed substrate.
机译:提供一种用于制造喷嘴基板的方法,一种用于制造液滴排放头的方法,一种用于排放液滴的头以及一种用于排放液滴的设备,以通过易于处理来提高根据材料的生产率和生产率。制造喷嘴基板的方法包括以下步骤:通过蚀刻工艺形成作为多个喷嘴孔的凹单元,以在被处理的基板上排放液滴,在基板的处理侧的表面上耦合第一维持基板(61)。具有凹部的被处理基板,从第一保持基板的接合面的相反侧,根据所希望的厚度,对被处理基板进行薄壁化处理,从而使凹部的边缘开口,在基板的表面上接合第二保持基板。凹单元的开口侧,从处理后的基板上剥离第一维持基板,并在剥离的表面上结合第三基板,并从处理后的基板上剥离第二维持基板。

著录项

  • 公开/公告号KR20070089074A

    专利类型

  • 公开/公告日2007-08-30

    原文格式PDF

  • 申请/专利权人 SEIKO EPSON CORPORATION;

    申请/专利号KR20070018936

  • 发明设计人 ARAKAWA KATSUJI;

    申请日2007-02-26

  • 分类号B41J2/16;B41J2/135;

  • 国家 KR

  • 入库时间 2022-08-21 20:33:39

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