SUBSTRATE PROCESSING APPARATUS, DEPOSIT MONITORING APPARATUS, AND DEPOSIT MONITORING METHOD

摘要

A substrate processing apparatus, a deposit monitoring apparatus, and a deposit monitoring method are provided to monitor a deposit by using an exposed part of an optical fiber arranged within a processing chamber. A substrate processing apparatus includes a deposit monitoring unit(50). The deposition monitoring unit monitors a deposit within a processing chamber for performing a predetermined treatment process on a processing target substrate. The deposit monitoring unit includes an optical fiber(60) disposed within the processing chamber in order to expose at least a part, a light emitting unit connected to one end of the optical fiber and emitting incident light to the optical fiber, and a light receiving unit connected to another end of the optical fiber and receiving the light penetrating the optical fiber.