SUBSTRATE PROCESSING APPARATUS, DEPOSIT MONITORING APPARATUS, AND DEPOSIT MONITORING METHOD

摘要

The substrate processing apparatus is able to monitor in real time the contamination caused by deposits. In order to monitor the deposits adhering to the inner wall surface of the processing chamber in which processing is executed on the substrate, sediment monitoring device of the substrate processing apparatus, apart and arranged to each other, both a sensor for measuring the capacitance between two conductors connected to the sensor It included. Capacitance between the conductors is increased with increasing the amount of sediment, and reflects the state of the contamination caused by deposits.