SUBSTRTE SUPPORT STRUCTURE, HEAT TREATMENT APPARATUS USING SAME, FIRST SHEET-LIKE OBJECT FOR USE IN THE SUBSTRATE SUPPORT STRUCTURE, METHOD OF MANUFACTURING THE SUBSTRATE SUPPORT STRUCTURE, HEAT TREATMENT APPARATUS, AND SUBSTRATE SUCKING METHOD

摘要

A substrate support structure, a heat treatment apparatus using the same, a first sheet-like member for use in the same, a method of manufacturing the same, a heat treatment apparatus, and a substrate sucking method are provided to inhibit variations in thermal hysteresis between contact parts with protrusions and non-contact parts in a substrate. A substrate(W) is supported by a plate body, and a first sheet-like member(11) of resin is formed on an upper surface of the plate body. The first sheet-like member has protrusions(13) for supporting the substrate in contact. The protrusions of the first sheet-like member are subjected to an etching process. The first sheet-like member has a ring-like lip(15) contacting edge regions of the substrate, in which the lip is subjected to an etching process.