首页> 外国专利> AGENT REDUCING FILM RESIDUES AFTER DEVELOPMENT AND PHOTOSENSITIVE RESIN COMPOSITION COMPRISING THE SAME

AGENT REDUCING FILM RESIDUES AFTER DEVELOPMENT AND PHOTOSENSITIVE RESIN COMPOSITION COMPRISING THE SAME

机译:显影后减少膜残留的代理和包含相同成分的光敏树脂组合物

摘要

The present invention provides a multi-functional acryl groups and a photosensitive resin composition containing the reduced residue and this phenomenon, including compounds containing two or more carboxylic acid groups (-COOH) of the formula: ; [Formula 1] ; In the formula, R1 and R2 are each H or CH3, * is a connection. ; When adding the compound to the colorant-containing photosensitive resin composition, the compound at the same time not only has excellent solubility in solvents by groups multifunctional acrylic increase the photopolymerization density of the photosensitive resin composition to prevent desorption of the color pattern, at least two carboxylic acid groups can be removed by the development residue of the photosensitive resin composition. ; A resin composition for a photosensitive resin composition, a color filter, multi-functional acryl groups, carboxylic acid groups
机译:本发明提供了具有减少的残基和该现象的多官能丙烯酸基和光敏树脂组合物,包括具有下式的两个或更多个羧酸基(-COOH)的化合物: [公式1] ;式中,R 1和R 2分别为H或CH 3,*为连接。 ;当将化合物添加到含着色剂的光敏树脂组合物中时,该化合物不仅通过在多官能丙烯酸基团中在溶剂中具有优异的溶解性而增加了光敏树脂组合物的光聚合密度以防止彩色图案的脱附,至少两种可以通过光敏树脂组合物的显影残余物除去羧酸基团。 ;用于光敏树脂组合物的树脂组合物,滤色片,多功能丙烯酸基团,羧酸基团

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