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AGENT REDUCING FILM RESIDUES AFTER DEVELOPMENT AND PHOTOSENSITIVE RESIN COMPOSITION COMPRISING THE SAME
AGENT REDUCING FILM RESIDUES AFTER DEVELOPMENT AND PHOTOSENSITIVE RESIN COMPOSITION COMPRISING THE SAME
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机译:显影后减少膜残留的代理和包含相同成分的光敏树脂组合物
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摘要
The present invention provides a multi-functional acryl groups and a photosensitive resin composition containing the reduced residue and this phenomenon, including compounds containing two or more carboxylic acid groups (-COOH) of the formula: ; [Formula 1] ; In the formula, R1 and R2 are each H or CH3, * is a connection. ; When adding the compound to the colorant-containing photosensitive resin composition, the compound at the same time not only has excellent solubility in solvents by groups multifunctional acrylic increase the photopolymerization density of the photosensitive resin composition to prevent desorption of the color pattern, at least two carboxylic acid groups can be removed by the development residue of the photosensitive resin composition. ; A resin composition for a photosensitive resin composition, a color filter, multi-functional acryl groups, carboxylic acid groups
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