PROCESS FOR PREPARING NICKEL OXIDE THIN FILM BY METAL ORGANIC CHEMICAL VAPOR DEPOSITION USING NICKELII AMINOALKOXIDE

摘要

The present invention relates to metal organic chemical with a nickel amino alkoxide precursor compound of formula (I) as a raw material for nickel deposition (metal organic chemical vapor deposition, MOCVD) relates to a process for preparing a nickel oxide thin film , according to the method of the present invention can obtain a high-quality thin film of nickel oxide in the milder process conditions than conventional metal organic chemical vapor deposition there . ; [ formula 1] ; wherein , m is an integer ranging from 1 to 3 and , R ¹ , R ² , R ³ and R ⁴ are independently C ₁ -C ₄ is a linear or branched alkyl group .