FACED TARGET SPUTTERING APPARATUS AND THE CATHODE GUN THEREOF

摘要

The present invention relates to a counter-target sputtering device having a pair of targets facing each other and a cathode structure thereof. The opposed target sputtering apparatus includes a chamber, a pair of targets facing each other in parallel with a predetermined distance in the chamber, and a first field disposed on a rear surface of each of the targets to generate a magnetic field in a direction perpendicular to the target surface. A magnetic field generating means, a shield ring provided around the target and the first magnetic field generating means, and a substrate holder provided to support the substrate at a predetermined distance from a target center outside the magnetic field region formed by the first magnetic field generating means. In the opposite target sputtering apparatus comprising a magnetic body or a second magnetic field generating means located between the target and the first magnetic field generating means.;Sputtering Device, Opposing Target, Magnetic Material