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OXIDE APERTURE LONG-WAVELENGTH VERTICAL CAVITY SURFACE EMITTING LASERS AND METHOD OF MANUFACTURING THE SAME

机译:氧化物孔径长波长垂直腔面发射激光及其制造方法

摘要

A long-wavelength vertical cavity surface emitting laser with an oxide aperture and a method of manufacturing the same are provided to control thickness of a current blocking layer by depending on epitaxial growth through low temperature re-growth as minimizing lattice defect. A semiconductor bottom mirror layer(2), a first semiconductor electrode layer(3), a gain active layer(4) and a semiconductor positive electrode layer(5) are grown on a compound semiconductor substrate(1) sequentially. A re-growth pattern with 10-100 micrometers width(L1) is formed on the semiconductor positive electrode layer through etching. A first low-temperature grown positive semiconductor buffer layer, a positive semiconductor layer for forming a second low-temperature grown oxide film, a positive semiconductor layer for tunnel junction, a negative semiconductor layer(7) for tunnel junction and a second semiconductor electrode layer(8) for electron injection are formed on the pattern. A top mirror layer is formed on the second semiconductor electrode layer.
机译:提供了一种具有氧化物孔径的长波长垂直腔表面发射激光器及其制造方法,以通过低温再生长的外延生长来控制电流阻挡层的厚度,从而使晶格缺陷最小。依次在化合物半导体衬底(1)上生长半导体底镜层(2),第一半导体电极层(3),增益有源层(4)和半导体正电极层(5)。通过蚀刻在半导体正极层上形成宽度为10〜100μm(L1)的再生长图案。第一低温生长的正半导体缓冲层,用于形成第二低温生长的氧化膜的正半导体层,用于隧道结的正半导体层,用于隧道结的负半导体层(7)和第二半导体电极层(8)在图案上形成用于电子注入的。在第二半导体电极层上形成顶镜层。

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