首页>
外国专利>
Two-dimensional hierarchical nanopatterning by colloidal lithography using photocrosslinkable particles
Two-dimensional hierarchical nanopatterning by colloidal lithography using photocrosslinkable particles
展开▼
机译:使用光可交联粒子的胶体光刻二维分层纳米图案
展开▼
页面导航
摘要
著录项
相似文献
摘要
The present invention relates to a multi-dimensional in detail than the nano pattern forming method using the photo-crosslinked colloidal particles is selectively directed to a method of forming a nano pattern by photo-crosslinking the coated colloidal particles to the substrate and then selectively etching the photo-crosslinking in the colloidal particles, and then heating the substrate. ; nano-patterning method using a photo-crosslinked colloidal particles of the present invention is ; step of photo-crosslinked colloidal particles on the substrate self-arranged, ; light crosslinkable colloid that includes a mask arranged on the substrate, and optionally transforming the colloidal particles that are not cross-linked by heating the substrate after the step of testing the light, ; was modified colloidal particles after etching the substrate and then and to include the step of removing the polymer colloidal particles to the substrate only optional part can form a nano pattern.
展开▼