首页> 外国专利> Two-dimensional hierarchical nanopatterning by colloidal lithography using photocrosslinkable particles

Two-dimensional hierarchical nanopatterning by colloidal lithography using photocrosslinkable particles

机译:使用光可交联粒子的胶体光刻二维分层纳米图案

摘要

The present invention relates to a multi-dimensional in detail than the nano pattern forming method using the photo-crosslinked colloidal particles is selectively directed to a method of forming a nano pattern by photo-crosslinking the coated colloidal particles to the substrate and then selectively etching the photo-crosslinking in the colloidal particles, and then heating the substrate. ; nano-patterning method using a photo-crosslinked colloidal particles of the present invention is ; step of photo-crosslinked colloidal particles on the substrate self-arranged, ; light crosslinkable colloid that includes a mask arranged on the substrate, and optionally transforming the colloidal particles that are not cross-linked by heating the substrate after the step of testing the light, ; was modified colloidal particles after etching the substrate and then and to include the step of removing the polymer colloidal particles to the substrate only optional part can form a nano pattern.
机译:本发明涉及一种多维的细节,比使用光交联的胶体粒子的纳米图案形成方法选择性地涉及通过将涂覆的胶体粒子光交联到基板上然后选择性地蚀刻来形成纳米图案的方法。胶体颗粒中的光交联,然后加热底物。 ;使用本发明的光交联的胶体粒子的纳米图案化方法是:自交联的基质上的光交联胶体粒子的步骤,光可交联胶体,其包括布置在基底上的掩模,并且在测试光的步骤之后,通过加热基底,任选地使未交联的胶体颗粒转变;在蚀刻基材之后,将改性的胶体颗粒改性,然后包括将聚合物胶体颗粒除去到基材上的步骤,只有任选的部分才能形成纳米图案。

著录项

  • 公开/公告号KR100746332B1

    专利类型

  • 公开/公告日2007-08-03

    原文格式PDF

  • 申请/专利权人

    申请/专利号KR20050070984

  • 发明设计人 문준혁;장세규;임종민;양승만;

    申请日2005-08-03

  • 分类号H01L21/3065;

  • 国家 KR

  • 入库时间 2022-08-21 20:31:38

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