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Lateral schottky - diode and method for their preparation

机译:横向肖特基二极管及其制备方法

摘要

Lateral semiconductor diode comprising:– a semiconductor body (1, 2) from a semiconductor substrate (1) and a is applied on top of the epitaxial layer (2), the p - or n - is doped to a major surface (5) forms,– a first contact device (6), which are located in from one side of the semiconductor body (1, 2) extending from and below the main surface (5) extending first trenches (3) in the epitaxial layer (2) is located and a schottky - contact to the semiconductor body (1,2), and– a second contact device (7), which are located in of a different side of the semiconductor body (1, 2) extending from and below the first main surface (5) extending second trenches (4) is located in the epitaxial layer and an ohmic contact with the semiconductor body (1, 2):– the first and the second trenches (3, 4) substantially in a finger-like manner and at a distance from each other engage in one another and– thus be between the two contact devices, only a through the schottky - contact..
机译:横向半导体二极管,包括:–来自半导体衬底(1)的半导体本体(1、2),并且a施加在外延层(2)的顶部,p-或n-掺杂到主表面(5)形成第一接触器件(6),其从半导体本体(1、2)的一侧位于外延层(2)的主表面(5)的下方并延伸,主表面(5)延伸第一沟槽(3)位于并肖特基-与半导体本体(1,2)接触,以及-第二接触器件(7),它们位于半导体本体(1、2)的另一侧,从第一侧延伸到第一侧下方延伸第二沟槽(4)的主表面(5)位于外延层中,并且与半导体本体(1、2)形成欧姆接触:–第一沟槽和第二沟槽(3、4)基本呈指状彼此之间保持一定距离,并且彼此之间-并且因此处于两个接触装置之间,仅通过肖特基-接触。

著录项

  • 公开/公告号DE102004041556B4

    专利类型

  • 公开/公告日2007-09-20

    原文格式PDF

  • 申请/专利权人

    申请/专利号DE20041041556

  • 发明设计人

    申请日2004-08-27

  • 分类号H01L29/872;H01L29/861;H01L21/329;

  • 国家 DE

  • 入库时间 2022-08-21 20:30:03

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