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Regulation of gas discharge phenomena and plasma, on deposition of thin layers by sputtering, uses a separate control of the current density and energy
Regulation of gas discharge phenomena and plasma, on deposition of thin layers by sputtering, uses a separate control of the current density and energy
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机译:通过溅射沉积薄层时,气体放电现象和等离子体的调节使用电流密度和能量的单独控制
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摘要
To regulate gas discharge phenomena and plasma, when depositing thin layers by sputtering, uses a separate regulation of the current density and the energy. The discharge is used as a conductor and accelerator of the ions to improve the transport of particles in the ionized gas zone.
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