A method for generating a mask layout imaging errors be avoided for a mask

摘要

A method for generating an image errors are avoided, final mask layout (20 '') for a mask (10), wherein the– a generated, provisional auxiliary - mask layout (110) in the final mask layout (20 '') with the aid of an opc - process is converted, wherein a main part (120, 130) of the preliminary auxiliary - mask layout (110) of the present invention is not optically auxiliary structures (160, 320) are associated with and within the framework of the opc - process exclusively of the optically not resolvable auxiliary structures (160, 320) is to be changed, wherein the main part (120, 130) itself remains unchanged,– the at least in the region of a partial section in a first direction oriented main part (120, 130) of the preliminary auxiliary - mask layout (110) is a group (315, 340) extending parallel to each other, are not decompose optically auxiliary structures (320, 350) associated therewith and the auxiliary structures of the group consisting of adjacent to the part, are aligned in a second direction, the different from said first direction,characterized by the,that within the scope of the opc - method for each optically not dissolvable auxiliary structure (160, 320) of the group each..