A method for generating a mask layout imaging errors be avoided for a mask

摘要

A method for generating an image errors are avoided, final mask layout (20 '') for a mask (10), in which a generated, provisional auxiliary - mask layout (100) in the final mask layout (20'') with the aid of an opc - method is transferred,– wherein, prior to the carrying out the opc - method with the preliminary auxiliary masks layout (100), first a modified auxiliary masks layout (100 '') is formed,– in that at least one optically not dissolvable auxiliary structure (130) between two mask structures (110, 120) of the preliminary auxiliary masks layout (100) is arranged,characterized in that– the optically not dissolvable auxiliary structure (130) between the two mask structures (110, 120) as a function of the structure size (b1, b2) of the two mask structures (110, 120) is placed, wherein, in the case of different sizes (δb) of the two mask structures are an off-center arrangement (v) of the optically non-dissolvable auxiliary structure (130) between the two mask structures takes place and– the eccentric arrangement (v) of the optically non-dissolvable auxiliary structure (130) is selected in such a manner that the optically not dissolvable auxiliary structure..