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Method for progressive process control e.g. for fabrication of semiconductor components, requires obtaining measurement data from some processed substrates
Method for progressive process control e.g. for fabrication of semiconductor components, requires obtaining measurement data from some processed substrates
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机译:渐进式过程控制的方法用于制造半导体组件,需要从一些处理过的基板上获得测量数据
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摘要
A method involves carrying out a specific fabrication process on a group of substrates in several equivalent process installations, obtaining measurement data from some substrates which are processed by the process installations, and determining up-dated values of the presetting values for the equivalent process installations as based on the measured data. The relative presetting values are weighted on the basis of the age of the measured data and the fabrication process is controlled on the basis of the weighted presetting values. An independent claim is given for a control system with model-based control section.
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