首页> 外国专利> Method for progressive process control e.g. for fabrication of semiconductor components, requires obtaining measurement data from some processed substrates

Method for progressive process control e.g. for fabrication of semiconductor components, requires obtaining measurement data from some processed substrates

机译:渐进式过程控制的方法用于制造半导体组件,需要从一些处理过的基板上获得测量数据

摘要

A method involves carrying out a specific fabrication process on a group of substrates in several equivalent process installations, obtaining measurement data from some substrates which are processed by the process installations, and determining up-dated values of the presetting values for the equivalent process installations as based on the measured data. The relative presetting values are weighted on the basis of the age of the measured data and the fabrication process is controlled on the basis of the weighted presetting values. An independent claim is given for a control system with model-based control section.
机译:一种方法涉及在几个等效的工艺设备中对一组基板执行特定的制造工艺,从由该工艺设备处理过的某些基板中获取测量数据,并确定等效工艺设备的预设值的更新值,例如根据实测数据。相对的预设值基于测量数据的使用期限进行加权,并且制造过程基于加权的预设值进行控制。具有基于模型的控制部分的控制系统具有独立权利要求。

著录项

  • 公开/公告号DE102005046972A1

    专利类型

  • 公开/公告日2007-04-05

    原文格式PDF

  • 申请/专利权人 ADVANCED MICRO DEVICES INC.;

    申请/专利号DE20051046972

  • 发明设计人 STIRTON JAMES BROC;HOLFELD ANDRE;

    申请日2005-09-30

  • 分类号H01L21/66;

  • 国家 DE

  • 入库时间 2022-08-21 20:29:43

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号