首页> 外国专利> Determining dopant content of doped amorphous semiconductor layer on carrier comprises use of spectral ellipsometry and reference Tauc curve

Determining dopant content of doped amorphous semiconductor layer on carrier comprises use of spectral ellipsometry and reference Tauc curve

机译:确定载流子上掺杂的非晶半导体层的掺杂剂含量包括使用光谱椭圆仪和参考Tauc曲线

摘要

Determining the dopant content of a doped amorphous semiconductor layer (10) on a carrier (1) comprises preparing a reference Tauc curve relating dopant concentration to the slope (b) of the linear region. The square root of the product of absorption coefficient (alpha ) and photon energy (E) (y axis) is plotted against photon energy and the slope (b) equals delta y/delta (E -Et) where Et is the band gap. The plot is repeated for the dopant layer to be tested using spectral ellipsometry, the slope (b) is found and thus the dopant concentration.
机译:确定载体(1)上的掺杂的非晶半导体层(10)的掺杂剂含量包括准备参考Tauc曲线,该参考Tauc曲线将掺杂剂浓度与线性区域的斜率(b)相关联。绘制吸收系数(α)与光子能量(E)(y轴)乘积的平方根与光子能量的关系,斜率(b)等于Δy /δ(E -Et),其中Et是带隙。对于要使用光谱椭圆偏振法测试的掺杂剂层,重复该图,可以找到斜率(b),从而得出掺杂剂浓度。

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