首页> 外国专利> An amorphous silicon dioxide form body is partly or wholly glazed and infiltrated during melt phase with Barium, Aluminum or Boron compounds

An amorphous silicon dioxide form body is partly or wholly glazed and infiltrated during melt phase with Barium, Aluminum or Boron compounds

机译:非晶态二氧化硅成型体在熔融阶段会与钡,铝或硼化合物部分或全部上光并渗透

摘要

An amorphous silicon dioxide form body is partly or wholly glazed, in which areas it is infiltrated with a substance that, on heating to a temperature between 1000[deg] to 1800[deg]C, crystallizes the glazed zones. The infiltrated substance is from the group of Barium, Aluminum or Boron compounds, or a mixture of these.
机译:非晶态二氧化硅成型体被部分或全部上釉,在该区域中渗透有一种物质,该物质在加热到1000℃至1800℃之间的温度时会使上釉的区域结晶。渗透的物质选自钡,铝或硼化合物,或它们的混合物。

著录项

  • 公开/公告号DE102005047112A1

    专利类型

  • 公开/公告日2007-04-05

    原文格式PDF

  • 申请/专利权人 WACKER CHEMIE AG;

    申请/专利号DE20051047112

  • 发明设计人 SCHWERTFEGER FRITZ;

    申请日2005-09-30

  • 分类号C03C10/00;C03B32/02;C30B15/10;

  • 国家 DE

  • 入库时间 2022-08-21 20:29:42

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