Coating method for surface of semiconductor body, involves clearing away thin layer near surface within range of surface of semiconductor body, which is coated, by sputtering

摘要

The method involves clearing away a thin layer near the surface within the range of the surface (101) of the semiconductor body (100), which is coated, by sputtering. A layer is applied on the latter surface, within which the layer near the surface was cleared away. The layer is an amorphous carbon layer or an amorphous semiconductor layer.