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Semiconductor component for power uses has super blocking arrangement having alternating first and second type dopant layers between substrate and channel
Semiconductor component for power uses has super blocking arrangement having alternating first and second type dopant layers between substrate and channel
A semiconductor component comprises a semiconductor substrate (1) of a first dopant type and a channel (4) of second dopant type with blocking layers between them (2,3). These comprise many alternating regions of first (2) and second (3) dopant types in a direction parallel to the principal substrate surface. The semiconductor regions with second type dopant have a higher impurity concentration than those of the first type. Independent claims are also included for the following: (A) A semiconductor component as above having a trench structure;and (B) A production process for the above.
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