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THERMAL PROJECTION DEVELOPING METHOD OF TARGET BASED ON SILICON AND ZIRCONIUM

机译:基于硅和锆的目标热投影发展方法

摘要

Method of producing a target by thermal spraying, especially by plasma spraying, said target comprising at least one compound based on atoms of different types chosen especially from the constituents M belonging to the (Zr, Mo, Ti, Nb, Ta, Hf, Cr) family and silicon, characterized in that at least one fraction of said compound, the constituents of which are bonded by covalent and/or ionic and/or metallic bonds, is injected into a plasma jet, said plasma jet spraying the constituents of said compound onto the target so as to deposit a coating of said compound on a surface portion of said target.
机译:通过热喷涂,特别是通过等离子喷涂生产靶的方法,所述靶包括至少一种基于不同类型原子的化合物,所述化合物尤其选自(Zr,Mo,Ti,Nb,Ta,Hf,Cr族和硅),其特征在于将至少一部分所述化合物(其成分通过共价键和/或离子和/或金属键结合)注入等离子流中,所述等离子流喷雾所述化合物的成分沉积在靶上,以便在所述靶的表面部分上沉积所述化合物的涂层。

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