Formation of functional thin film for solar cell, involves forming thin film by plasma-chemcal vapor deposition apparatus while applying bias voltage, cleaning components of deposition apparatus, and forming film in another bias voltage

摘要

A thin film is formed by a high-frequency plasma chemical vapor deposition (CVD) apparatus while applying bias voltage (I). The components of CVD apparatus are cleaned or replaced. Thin film is formed using the CVD apparatus by applying bias voltage (II) lower than voltage (I) for predetermined period. The voltage is returned to bias voltage (I), and a functional thin film is formed.