Procedure for elaboration of sequenced nano-structures e.g. for micro-electronics comprises substrate delivery and attack phases to produce nanometric projections

摘要

The procedure for creating sequenced nano-structures consists of providing a substrate (100) with a barrier layer (2) beneath a crystalline film less than one micrometre thick with lattice defects and/or stress fields in a crystalline zone and subjecting it to one or more attack stages. The attack stages expose the barrier layer locally and create projections (7) on a nanometric scale, separated by recesses (7.1) with their bases in the barrier layer to form nano-structures (7, 8). The height of the nano-structures can be increased, if necessary, by engraving the barrier layer, with the projections acting as a mask during this process.