RETICLE DEFECT INSPECTION DEVICE AND RETICLE DEFECT INSPECTION METHOD
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机译:十字缺陷检查装置和十字缺陷检查方法
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摘要
PROBLEM TO BE SOLVED: To provide a reticle defect inspection device and a reticle defect inspection method capable of performing defect inspection with high detection sensitivity by easily correcting focus deviation of transmitted illumination light due to deviation in the thickness of the reticle.;SOLUTION: The reticle defect inspection device performing the inspection of a defect on a measurement sample using a pattern image obtained by irradiating the measurement sample with a pattern formed thereon with light includes: a transmissive illumination optical system irradiating one surface of the measurement sample with first inspection light; a reflective illumination optical system irradiating the other surface of the measurement sample with second inspection light; and a detection optical system capable of simultaneously detecting the transmitted light by the irradiation of the measurement sample with the first inspection light and the reflected light by the irradiation of the measurement sample with the second inspection light. The transmissive illumination optical system includes a focusing lens driving mechanism correcting the focusing deviation of the transmitted light originated in the thickness of the measurement sample. The reticle defect inspection method by the reticle defect inspection device is also provided.;COPYRIGHT: (C)2009,JPO&INPIT
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