首页> 外国专利> RETICLE DEFECT INSPECTION DEVICE AND RETICLE DEFECT INSPECTION METHOD

RETICLE DEFECT INSPECTION DEVICE AND RETICLE DEFECT INSPECTION METHOD

机译:十字缺陷检查装置和十字缺陷检查方法

摘要

PROBLEM TO BE SOLVED: To provide a reticle defect inspection device and a reticle defect inspection method, which suppresses damages on a reticle by irradiation with inspection light when a reticle is inspected in a still state.;SOLUTION: The reticle defect inspection device and the reticle inspection method aim to inspect a defect on a reticle by using a pattern image obtained by irradiating the reticle 101 having the pattern formed thereon with light, and are characterized in that the inspection device includes: a dose monitoring means 72 for measuring a dose of light on the reticle; a means 74 for calculating a cumulative dose from the dose measured by the dose monitoring means and comparing with a preliminarily determined threshold; and a means 76 for stopping irradiation of the reticle with light when the cumulative dose resulted from the comparison exceeds the threshold.;COPYRIGHT: (C)2009,JPO&INPIT
机译:解决的问题:提供一种分划板缺陷检查装置和分划板缺陷检查方法,其在静止状态下对分划板进行检查时能够抑制由于照射检查光而对分划板造成的损伤。掩模版检查方法旨在通过使用图案图像来检查掩模版上的缺陷,该图案图像是通过对形成有图案的掩模版101照射光而获得的,其特征在于,该检查装置包括:剂量监测装置72,用于测量剂量。光罩上的光装置74,用于根据剂量监测装置测得的剂量计算累积剂量,并与预先确定的阈值进行比较;当比较产生的累积剂量超过阈值时,停止光照射掩模版的装置76。版权所有:(C)2009,JPO&INPIT

著录项

  • 公开/公告号JP2008268424A

    专利类型

  • 公开/公告日2008-11-06

    原文格式PDF

  • 申请/专利权人 ADVANCED MASK INSPECTION TECHNOLOGY KK;

    申请/专利号JP20070109289

  • 发明设计人 HIRANO RYOICHI;OGAWA TSUTOMU;

    申请日2007-04-18

  • 分类号G03F1/08;G01N21/956;H01L21/027;

  • 国家 JP

  • 入库时间 2022-08-21 20:22:22

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