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NON-CYANOGEN TYPE ELECTROLYTIC GOLD PLATING BATH FOR BUMP FORMATION
NON-CYANOGEN TYPE ELECTROLYTIC GOLD PLATING BATH FOR BUMP FORMATION
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机译:用于形成凹凸的非氰型电解金镀液
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摘要
PROBLEM TO BE SOLVED: To provide a non-cyanogen type electrolytic gold plating bath capable of attaining sufficient film hardness for covering the reduction of the reliability that, when a gold bump is joined with a mating substrate or the like, it is collapsed by pressure-sticking force and is widen, so as to cause a short-circuit.;SOLUTION: The non-cyanogen type electrolytic gold plating bath for bump formation comprises: a gold source composed of the alkali salt of gold sulfite or ammonium gold sulfite; a stabilizer composed of water soluble amine, a crystal regulator, conducting salts composed of a sulfite and a sulfate; and a buffer; and further comprises: polyalkylene glycol and/or an amphoteric surfactant. The bath comprises polyalkylene glycol with the average molecular weight of 300 to 900 by 1.5 to 20 g/L, or comprises polyalkylene glycol with the average molecular weight of 900 to 10,000 by ≥0.01 g/L and also comprises an amphoteric surfactant by 0.1 to 1,000 mg/L.;COPYRIGHT: (C)2008,JPO&INPIT
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机译:解决的问题:提供一种非氰型电解金镀液,该镀液能够获得足够的膜硬度,以弥补当金凸块与配合基板等接合时由于压力而塌陷的可靠性降低。解决方案:用于形成凸点的非氰基型电解金镀浴包括:由亚硫酸金的碱金属盐或亚硫酸金的铵盐组成的金源。由水溶性胺,晶体调节剂,由亚硫酸盐和硫酸盐组成的导电盐组成的稳定剂;和一个缓冲区;进一步包括:聚亚烷基二醇和/或两性表面活性剂。该浴包含平均分子量为300至<900乘1.5至20 g / L的聚亚烷基二醇,或包含平均分子量为900至10,000乘以0.01 g / L的聚亚烷基二醇,并且还包含两性表面活性剂0.1至1,000 mg / L .;版权所有:(C)2008,日本特许厅和INPIT
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