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NON-CYANOGEN TYPE ELECTROLYTIC GOLD PLATING BATH FOR BUMP FORMING

机译:凹凸成型用非氰型电解金镀液

摘要

assignment ; Suppressing the expansion of the plating material of the mask opening, and provides a bicyclic sight electrolytic gold plating bath which can form a bump or a wiring of a designed dimension and the dimension is not a big difference. ; It means to resolve ; Geumwon (金 源) and sulfite gold alkali salt or a sulfite gold ammonium as, the water-soluble amine as a stabilizer (stabilizer), crystal control agent and, and as sulfite and sulfate conductive salt, buffering agents and polyalkylene glycol and / or amphoteric surfactants Vichy bumps sight for containing the electrolytic gold plating bath. The blending amount of the polyalkylene glycol is 0.1㎎ ~ 10g / L are preferred, and the amount of amphoteric surfactant is preferably in the 0.1㎎~1g / L. Amphoteric surfactants may be preferably used as a carboxy betaine.
机译:分配 ;抑制了掩模开口的电镀材料的膨胀,并且提供了一种双环式电解电解镀金浴,该电镀浴可以形成设计尺寸的凸块或布线,并且尺寸之间没有很大差异。 ; 这意味着解决 ;金源(Geumwon)和亚硫酸金碱盐或亚硫酸金铵盐,水溶性胺作为稳定剂(稳定剂),晶体控制剂和亚硫酸盐和硫酸盐导电盐,缓冲剂和聚亚烷基二醇和/或两性表面活性剂维希颠簸瞄准镜包含电解镀金液。聚亚烷基二醇的混合量优选为0.1 4〜10g / L,两性表面活性剂的量优选为0.1 1〜1g / L。两性表面活性剂可以优选用作羧基甜菜碱。

著录项

  • 公开/公告号KR101319745B1

    专利类型

  • 公开/公告日2013-10-17

    原文格式PDF

  • 申请/专利权人

    申请/专利号KR20060086295

  • 发明设计人 나카무라 히로시;

    申请日2006-09-07

  • 分类号C25D3/48;

  • 国家 KR

  • 入库时间 2022-08-21 16:24:16

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