首页> 外国专利> REFLECTIVE PROJECTION LENS FOR EUV-PHOTOLITHOGRAPHY

REFLECTIVE PROJECTION LENS FOR EUV-PHOTOLITHOGRAPHY

机译:紫外光照相术的反光投影镜头

摘要

PROBLEM TO BE SOLVED: To provide an extreme ultraviolet (EUV) projection lens that is operable at high numerical aperture and capable of substantially correcting distortion errors along all the image directions.;SOLUTION: A projection lens is for imaging a pattern arranged on an object plane onto an image plane, by using electromagnetic radiation from an extreme ultraviolet (EUV) spectral region. The projection lens comprises a plurality of imaging mirrors, each of which has a reflective coating, which define the optical axis of the projection lens and which are arranged between the object plane and the image plane, wherein the plurality of mirrors are mutually disposed, such that each is irradiated over a range of incidence angles characteristic of the mirror, wherein at least the mirror having the largest range of incidence angles has an acentric, graded reflective coating having film thickness gradient which is rotationally symmetric with respect to a coating axis, and wherein the coating axis substantially coincides with the optical axis of the projection lens.;COPYRIGHT: (C)2009,JPO&INPIT
机译:要解决的问题:提供一种可在高数值孔径下工作并且能够基本校正沿所有图像方向的畸变误差的极紫外(EUV)投影透镜。通过使用来自极紫外(EUV)光谱区域的电磁辐射将图像平移到图像平面上。投影透镜包括多个成像镜,每个成像镜均具有反射涂层,该成像涂层限定了投影透镜的光轴并且布置在物平面和像平面之间,其中多个镜相互设置,例如分别在所述反射镜的特定入射角范围内进行照射,其中至少具有最大入射角范围的反射镜具有偏心的渐变反射涂层,该反射涂层的膜厚梯度相对于涂层轴旋转对称,并且(C)2009,JPO&INPIT,其中涂层轴与投影透镜的光轴基本重合。

著录项

  • 公开/公告号JP2008262223A

    专利类型

  • 公开/公告日2008-10-30

    原文格式PDF

  • 申请/专利权人 CARL ZEISS SMT AG;

    申请/专利号JP20080180036

  • 申请日2008-07-10

  • 分类号G02B17/08;G02B13/18;G02B5/08;H01L21/027;G03F7/20;

  • 国家 JP

  • 入库时间 2022-08-21 20:23:34

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