WAVELENGTH SELECTION METHOD, FILM THICKNESS MEASUREMENT METHOD, FILM THICKNESS MEASURING DEVICE, AND SYSTEM FOR MANUFACTURING THIN-FILM SILICON-BASED DEVICE

摘要

PROBLEM TO BE SOLVED: To reduce measurement errors in film thickness measurement which ends up being included in the measurement result which is larger than the tolerance level, as the amount of transmitted light varies, when the thickness of a thin film different in unevenness conditions of the surface of the thin film or a board is evaluated.;SOLUTION: In this wavelength selection method for selecting a wavelength to be used for the thickness measurement of the thin film, rays of illumination light of different wavelengths are irradiated to a plurality of sample films which areformed on the board and different in film quality conditions and thickness; an evaluation value relating to the amount of transmitted light, produced when illumination light of each wavelength is irradiated, is measured, respectively, based on the measured resu film thickness properties representing correlation between an evaluation value and the film thickness in each film quality condition, is produced for each wavelength; and a wavelength where the measurement of the difference in the evaluation values by the film quality conditions lie within a predetermined range in each film thickness properties can be selected.;COPYRIGHT: (C)2008,JPO&INPIT