首页> 外国专利> SILVER HALIDE PHOTOSENSITIVE MATERIAL, CONDUCTIVE FILM, ELECTROMAGNETIC WAVE SHIELD FILM, OPTICAL FILTER FOR PLASMA DISPLAY PANEL, PLASMA DISPLAY PANEL, AND MANUFACTURING METHOD OF CONDUCTIVE FILM

SILVER HALIDE PHOTOSENSITIVE MATERIAL, CONDUCTIVE FILM, ELECTROMAGNETIC WAVE SHIELD FILM, OPTICAL FILTER FOR PLASMA DISPLAY PANEL, PLASMA DISPLAY PANEL, AND MANUFACTURING METHOD OF CONDUCTIVE FILM

机译:卤化银光敏材料,导电膜,电磁波屏蔽膜,等离子显示屏的光学滤光片,等离子显示屏以及导电膜的制造方法

摘要

PROBLEM TO BE SOLVED: To provide a silver halide photosensitive material with excellent productivity and a low-cost property and without black point spots or resistance unevenness generated, and a conductive film formed by using above.;SOLUTION: Of the silver halide photosensitive material obtaining a conductive metal film 30 by carrying out exposure and development treatments to a silver halide emulsion layer 36 provided at one side of a support 32, a side face resistance is 107 to 1012. An easy adhesion layer 50 containing conductive metal oxide particles is included on the surface with the silver halide emulsion layer 36 coated opposite to the support 32. The conductive metal oxide particles are needle-like particles, a ratio of a long axis to its short axis is in a range from 3 to 50. The conductive metal oxide particles are SnO2 particles with antimony doped. A content of the conductive metal oxide particles is from 0.01 to 30 g/m2.;COPYRIGHT: (C)2009,JPO&INPIT
机译:解决的问题:提供一种具有优异的生产率和低成本特性并且没有产生黑点或电阻不均匀性的卤化银感光材料,以及通过使用上述方法形成的导电膜。通过对设置在支撑体32一侧的卤化银乳剂层36进行曝光和显影处理,形成导电金属膜30,其侧面电阻为10 7 至10 12 。在表面上包括含有导电金属氧化物颗粒的易粘合层50,卤化银乳剂层36与载体32相对地涂覆。导电金属氧化物颗粒是针状颗粒,长轴与短轴之比在3至50范围内。导电金属氧化物颗粒是掺锑的SnO 2 颗粒。导电金属氧化物颗粒的含量为0.01至30 g / m 2 。;版权所有:(C)2009,JPO&INPIT

著录项

  • 公开/公告号JP2008243726A

    专利类型

  • 公开/公告日2008-10-09

    原文格式PDF

  • 申请/专利权人 FUJIFILM CORP;

    申请/专利号JP20070085677

  • 发明设计人 OKAMOTO YASUHIRO;SASAKI HIROTOMO;

    申请日2007-03-28

  • 分类号H01B5/14;H01B13;H05K9;

  • 国家 JP

  • 入库时间 2022-08-21 20:22:32

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