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Photoactive thin film, its preparation and use, the formation of the optically anisotropic structure and surface relief caused by and irradiating the thin film

机译:光敏薄膜,其制备和用途,光学各向异性结构的形成以及由薄膜和照射薄膜引起的表面起伏

摘要

The present invention, there is provided a homogeneous photoactive thin film of them alone, or containing a polymer electrolyte having a residue undergoes a photoreaction, the formula (I) ~ ie (IV), the polymer electrolyte, [Pol ( R * -P-R')] oon + n / xA x- (I), n / xA x + [Pol (R * -P-R')] oon- (II), [Pol (R 1 * - from the structure of at least one Q-R 1 ')] oon + n / xA x- (III), n / xA x + [Pol (R 1 * -Q-R 1' or one of)] oon- (IV) on homogeneous photoactive thin film composed of the main. Here, Pol is a repeating unit of the polymer chain branched or linear, to represent the number of repeating units in the polymer chain, and (R * -P-R') o is, (R 1 * -Q-R 1 A '), and positively or negatively charged, an n fold side chains of the repeating unit Pol, where, P is a group capable of undergoing a photo-induced E / Z isomerization, Q is photoaddition cyclization a group capable of participating in, or a group capable of participating in photoinduced rearrangement, or a group capable of participating in what is referred to as the light over Fries reaction, A is oppositely charged is an anion or cation has, n is preferably 1 or 2, x is 2 or 1, o is at least 2, except that in the polymer electrolyte of one group and [R-P-R'] / or [R 1 -P-R 1 '] all have the same sign. The present invention further provides a direct its use and how to provide a copy of the thin film of the present invention having the thin film, the surface relief structure. [Selection] Figure Figure 1
机译:本发明提供了单独的均质光敏薄膜,或包含具有残留物的聚合物电解质,该聚合物电解质具有进行光反应的残基,式(I)〜即(IV),聚合物电解质,[Pol( R * -P-R')] on + n / xA x-(I), n < / Sup> / xA x + [Pol (R * -P-R')] o on-(II), [Pol (R 1 * -从至少一个 QR 1 '的结构中得出) ] o on + n / xA x-(III), n / xA x + [Pol(R 1 * -QR 1'或其中之一)] o on-(四)以均质光敏薄膜为主。此处,Pol是支链或直链聚合物链的重复单元,代表聚合物中的重复单元数,(R * -P-R')o为 (R 1 * -QR 1 A'),并带有正电荷或负电荷,是重复单元Pol的n折叠侧链,其中,P是能够进行光诱导的E / Z异构化的基团, Q是光加成环化,是一个能够参与的基团,或者能够参与光致重排的基团,或者是能够参与所谓的弗里斯之上的弗里斯反应的基团,A是带有负电荷的阴离子或阳离子, n优选为1或2,x为2或1,o为至少2,除了在一组聚合物电解质中和[RP-R'] /或 [R 1 -PR 1 ']都具有相同的符号。本发明进一步提供其直接用途,以及如何提供具有薄膜,表面浮雕结构的本发明薄膜的复制品。 [选择]图图1

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