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外文期刊>中国科学院近代物理研究所和兰州重离子研究装置年报:英文版
>Investigation of Heavy Ion Irradiation Effects on Microstructural and Optical Properties of Amorphous HfO_(2) Thin Films
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Investigation of Heavy Ion Irradiation Effects on Microstructural and Optical Properties of Amorphous HfO_(2) Thin Films
Amorphous HfO_(2) is widely utilized as high-k gate dielectric materials for reducing the tunneling leakage current and improving the reliability to overcome the physical limitation of traditional gate dielectric like SiO_(2)[1,2].
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