首页> 外国专利> VERTICAL-FURNACE SEMICONDUCTOR MANUFACTURING SYSTEM AND LOT-UNIT WAFER TRANSFER PROCESSING METHOD USING THE SAME

VERTICAL-FURNACE SEMICONDUCTOR MANUFACTURING SYSTEM AND LOT-UNIT WAFER TRANSFER PROCESSING METHOD USING THE SAME

机译:垂直炉半导体制造系统和采用该方法的批量单元晶圆转移处理方法

摘要

PPROBLEM TO BE SOLVED: To provide a vertical-reactor semiconductor manufacturing system that improves productivity, and to provide a lot-unit wafer transfer processing method that uses the same. PSOLUTION: A vertical-furnace semiconductor manufacturing system includes an operator interface server 10, which inputs process conditions, checks the presence or the absence of use of a monitor wafer, and generates the input number of lots and a "track-in" command; a host computer 14, which controls a process device by receiving a command from the operator interface server 10, collects data generated from the process device so as to provide them to the operator interface server 10, and controls in order to transfer wafer carriers in lots, before wafer carriers that correspond to one batch are all stored, when the "track-in" command is inputted from the operator interface server 10; and the process device 16 that transfers the wafer carriers in lots by a control command of the host computer 14 so as to store wafers in a wafer boat. PCOPYRIGHT: (C)2009,JPO&INPIT
机译:

要解决的问题:提供一种提高生产率的垂直反应器半导体制造系统,并提供一种使用该系统的批量晶片转移处理方法。解决方案:垂直炉半导体制造系统包括操作员界面服务器10,该操作员界面服务器10输入处理条件,检查是否使用监控晶片,并生成输入的批数和“跟踪”。 “命令;主机14,其通过从操作员接口服务器10接收命令来控制处理设备,收集从处理设备生成的数据以将其提供给操作员接口服务器10,并进行控制以成批地转移晶片载体在从操作员接口服务器10输入“跟踪”命令时,在全部存储与一批对应的晶片载体之前,处理装置16,其通过主计算机14的控制指令将晶片搬运器分批搬运,从而将晶片存放在晶片舟皿中。

版权:(C)2009,日本特许厅&INPIT

著录项

  • 公开/公告号JP2008270800A

    专利类型

  • 公开/公告日2008-11-06

    原文格式PDF

  • 申请/专利权人 SAMSUNG ELECTRONICS CO LTD;

    申请/专利号JP20080102982

  • 发明设计人 CHUNG JAE-WOO;CHOI SANG-KOOK;

    申请日2008-04-11

  • 分类号H01L21/02;H01L21/31;H01L21/677;

  • 国家 JP

  • 入库时间 2022-08-21 20:21:55

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