METHOD OF DESIGNING ELECTRONIC CIRCUIT APPARATUS, METHOD OF FORMING ELECTRON BEAM EXPOSURE DATA, AND METHOD OF EXPOSING ELECTRONIC BEAM

摘要

PROBLEM TO BE SOLVED: To provide a method of designing an electronic circuit apparatus, a method of forming electron beam exposure data, and a method of exposing electronic beam, which control a total of the number of block preparation of a contact layer and a first metal wiring layer, in an especially frequently used cell within the maximum number to be mounted on a block mask to shrink the shot number.;SOLUTION: Two kinds of cells 1 and 2 are selected among a plurality of cells that construct an electronic circuit apparatus, one kind of cells 1 of the two kinds of cells 1 and 2 is rotated, or inverted, or rotated and inverted, cells 3 to 5 after rotation, or inversion, or rotation and inversion are replaced to the other kind of cells 2 of the two kinds of cells 1 and 2, to compile a database and to constitute a cell library.;COPYRIGHT: (C)2008,JPO&INPIT