首页> 外国专利> VOLATILE ORGANIC CHLORINE COMPOUND DECOMPOSITION SYSTEM AND VOLATILE ORGANIC CHLORINE COMPOUND DECOMPOSITION METHOD

VOLATILE ORGANIC CHLORINE COMPOUND DECOMPOSITION SYSTEM AND VOLATILE ORGANIC CHLORINE COMPOUND DECOMPOSITION METHOD

机译:挥发性有机氯化合物的分解系统及挥发性有机氯化合物的分解方法

摘要

PROBLEM TO BE SOLVED: To provide a volatile organic chlorine compound decomposition system which does not need large running cost and is easy in maintenance.;SOLUTION: This volatile organic chlorine compound decomposition system 1, which is provided with an adsorption device 10 for adsorbing an organic chlorine compound A in gas G1 to an adsorption means K, transferring the organic chlorine compound A adsorbed in the adsorption means K to regeneration steam S1 of the adsorption means K and regenerating the adsorption means K, comprises: an oxidizing decomposition device 30 for oxidizingly decomposing the organic chlorine compound A in condensate L1 by adding an oxidizing means B to the condensate L1 of the regeneration steam S1 containing the organic chlorine compound A; and a surplus oxidation means for decomposition device 50 decomposing the surplus oxidation means B added to the oxidizing decomposition device 30 by using a reducing decomposition means C.;COPYRIGHT: (C)2008,JPO&INPIT
机译:解决的问题:提供一种挥发性有机氯化合物分解系统,该系统不需要大的运行成本,并且易于维护。解决方案:该挥发性有机氯化合物分解系统1设有用于吸附有机物的吸附装置10。气体G1中的有机氯化合物A传递到吸附装置K,将吸附在吸附装置K中的有机氯化合物A转移到吸​​附装置K的再生蒸汽S1中并使吸附装置K再生,包括:用于氧化的氧化分解装置30。通过向包含有机氯化合物A的再生蒸汽S1的冷凝物L1中添加氧化手段B,来使冷凝物L1中的有机氯化合物A分解。分解装置50的剩余氧化装置使用还原分解装置C分解添加到氧化分解装置30中的剩余氧化装置B。COPYRIGHT:(C)2008,JPO&INPIT

著录项

  • 公开/公告号JP2008049305A

    专利类型

  • 公开/公告日2008-03-06

    原文格式PDF

  • 申请/专利权人 KURITA WATER IND LTD;

    申请/专利号JP20060229972

  • 发明设计人 SUGIMOTO BISEI;

    申请日2006-08-28

  • 分类号B01D53/70;B01D19/00;C02F1/72;B01D53/04;C02F1/20;C02F1/70;C02F1/78;C07B37/06;C07B35/06;

  • 国家 JP

  • 入库时间 2022-08-21 20:20:50

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