TARGET FOR MAGNETRON SPUTTERING, TRANSPARENT CONDUCTIVE FILM DEPOSITION METHOD, AND METHOD OF MANUFACTURING ORGANIC ELECTROLUMINESCENCE ELEMENT

摘要

PROBLEM TO BE SOLVED: To provide a sputtering target capable of depositing a transparent conductive film by the magnetron sputtering without any wasteful consumption of a sputtering target material, and easily controlling the resistivity and the transmittance of the transparent conductive film in a target for the magnetron sputter which has a mask on a substrate to perform the pattern-forming of the transparent conductive film on the substrate by the magnetron sputtering method.;SOLUTION: The target for the magnetron sputter is obtained by inserting targets of columnar pin shape formed of the same material for a transparent conductive film as the target or other conductive material for the transparent conductive film in a large number of holes in a disk-shaped target formed of a material for the transparent conductive film having a large number of holes opened therein in a completely filling manner.;COPYRIGHT: (C)2008,JPO&INPIT