Application to lithography light source using extreme ultraviolet radiation of the device and the extreme ultraviolet generator

摘要

It is possible to enable effective light collection SOLVED] extreme ultraviolet radiation, to provide a device capable of reducing the manufacturing and operating costs. The extreme ultraviolet generating apparatus of the present invention comprises, laser output a number of sources, condenser (2), the first (4) generator (11,110), vacuum space forming means, target focusing means ( and a 10, 110), as well as located in the space of the half side of (1) to position the laser beam on the target, the average collection optical axis of the focusing means the focusing means, with respect to (6) The inclined angle of 90 ° in the (β) of about 60 ° Te, is located; condensing the first device is the average space half side of the laser beam the target (4) (1) is located and are arranged symmetrically Atsumarihikari-jiku (6) around and located in a conical space with vertices located in (4) the target with the center of the average light collection axis (6), half of the vertex ( α) is characterized by the focused laser beam with respect to (6) The average collection optical axis inclination angle of (1) (β) less than that. [Selection] Figure Figure 1