DEVICE FOR GENERATING EXTREME ULTRAVIOLET LIGHT AND APPLICATION TO AN EXTREME ULTRAVIOLET RADIATION LITHOGRAPHY SOURCE

摘要

The invention concerns a device (2) for creating, in a vacuum space where laser beams (1) are focused, a substantially linear target capable of emitting by interaction with the focused laser beams (1) a plasma emitting an extreme ultraviolet radiation. A receiver device (3) receives the target (4) after its interaction with the focused laser beams (2), while a collector device (110) collects the EUV radiation emitted by the target (4). The elements (11) focusing the laser beams on the target (4) are arranged such that the laser beams (1) are focused laterally on the target (4) by being located in a common half-space relative to the target (4) and by being inclined at a predetermined angle between about 60° and 90° relative to a mean collecting axis (6) perpendicular to the target (4). The collector device (110) is arranged symmetrically relative to the means collecting axis (6) in the half-space containing the laser beams (1) focused on the target (4) and inside a conical space (8) centered on the mean collecting axis (6) with an apex located on the target (4) and a half-angle at apex smaller than the angle of inclination of the focused laser beams (1) relative to the mean collecting axis (6). The device is applicable to a EUV radiation lithography source for making integrated circuits.