首页> 外国专利> Copper powder for conductive paste, conductive paste using the copper powder, and chip component including a conductor using the conductive paste

Copper powder for conductive paste, conductive paste using the copper powder, and chip component including a conductor using the conductive paste

机译:用于导电膏的铜粉,使用该铜粉的导电膏以及包括使用该导电膏的导体的芯片组件

摘要

PROBLEM TO BE SOLVED: To obtain copper powder which allows a low temperature baking property required for the baking manufacture of a conductive body of chip component using a conductive paste which is produced by using the copper powder and is made lower in viscosity when being fabricated into the conductive paste. SOLUTION: In this copper powder which is used for production of conductive paste and has a surface oxidized layer, weight accumulative particle size D50 according to laser diffraction scattering type particle size distribution measurement method is 0.05 m to 10 m, the value of (SD/D50 )100 which is a relation between D50 and standard deviation SD of particle size distribution measured by the laser diffraction scattering type particle size distribution measurement method is =28 and the oxygen content of the copper powder is 0.5 wt.% to 3.0 wt.%. This copper powder is produced in such a manner that copper powder is subjected to heating treatment in the air or in an environment enhanced in oxygen partial pressure, the oxidized layer is formed on the surface of powder particle constituting the copper powder, the copper powder formed with the oxidized layer is subjected to re-powdering treatment, thereby the surface of powder particle is flattened and the powder particle in the state of aggregated state is separated.
机译:要解决的问题:获得一种铜粉,该铜粉具有使用通过使用铜粉制造的导电浆料进行制造时的粘度降低的粘度,该铜粉具有对芯片部件的导电体进行烘烤制造所需的低温烘烤性能。导电胶。 SOLUTION:在用于生产导电浆料并具有表面氧化层的铜粉中,根据激光衍射散射式粒度分布测量方法,重量累积粒度D50为0.05 m至10 m,(SD /通过激光衍射散射式粒度分布测定方法测定的D50与粒度分布的标准偏差SD之间的关系即D50 =100≤28,铜粉的氧含量为0.5〜3.0重量%。 %。以在空气中或在氧分压升高的环境中对铜粉进行热处理的方式生产该铜粉,在构成该铜粉的粉末颗粒的表面上形成氧化层,形成的铜粉对被氧化的层进行再粉化处理,从而使粉末粒子的表面平坦化,并且以凝集状态分离粉末粒子。

著录项

  • 公开/公告号JP4111425B2

    专利类型

  • 公开/公告日2008-07-02

    原文格式PDF

  • 申请/专利权人 三井金属鉱業株式会社;

    申请/专利号JP20010302407

  • 发明设计人 坂上 貴彦;

    申请日2001-09-28

  • 分类号H01B1/22;H01B1;H01B13;H01G4/12;H01G4/30;B22F1;B22F1/02;B22F9;

  • 国家 JP

  • 入库时间 2022-08-21 20:18:44

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